XRLM 1 Beamline (Port 2A)
Characteristics:
This beamline can operate in two modes - a 'white' light mode without any optics and a 'mirror' light mode.
'White' light mode
- 'White' spectrum, no optics, 2 Beryllium windows, 1st window, 100 µm thick , 2ndwindow 120 µm thick
- transmitted bandpass spectrum: 2.0 keV – 7 keV (10 keV @ 1.45 GeV)
- vertically integrated power incident on to the mask (100 mA): 314 mW/mrad @ 1.3 GeV, 730 mW/mrad horizontal acceptance @ 1.45 GeV
- source to exposure plane distance: 10.35 m.
- horizontal acceptance at mask plane: 10 milliradians
- horizontal beam width at the exposure plane: 104 mm.
'Mirror' light mode
- 2 Si mirrors, coated with one layer of Cr (Cr thickness > 120 nm)
- 1st mirror is water-cooled, 2nd mirror is un-cooled
- grazing angle: 0.5 deg – 1.2 deg corresponding to 8.73 mrad – 21 mrad
- distance source point – center 1st mirror: ~ 3 m
- horizontal acceptance 1st mirror: ~ 14 mrad
Scanner and Filter
- Filters:
- Currently the following filters can be used:
Filter 2: 6.8 µm Al
Filter 3: 6.7 µm Al
Filter 4: 6.3 µm Al
Filter 5: 5.8 µm Al
Filter 6: 61.0 µm Al
Filter 7: 50.0 µm Kapton
Filter 8: 100.0 µm Kapton
Filter 9: 42.0 µm Graphite
Filter 10: 42.0 µm Graphite
Filter 11: 42.0 µm Graphite
Al: ρ= 2.70 g/ccm
Kapton: ρ= 1.42 g/ccm
Graphite: ρ= 2.25 g/ccm
- Scanner: DEX02 from Jenoptik GmbH
- maximum length of vertical scan is 100 mm.
- maximum velocity is 50 mm/s
- mask formats are 5" standard NIST, modified NIST, large format, and
- 4" stainless steel ring
- Substrate: standard 4" wafer and 4.75" stainless steel mold insert blank
Special features: dark chamber environment, tilt/rotate option, aligned exposure option and mask/substrate cooling capabilities.